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An Artificial Intelligence for the Analysis of a DC Magnetron Sputtering System Combined with a Particle-in-Cell Simulation

Title
An Artificial Intelligence for the Analysis of a DC Magnetron Sputtering System Combined with a Particle-in-Cell Simulation
Authors
Kim, Yeun Jung; Lee, Hae June
Ewha Authors
김연정
SCOPUS Author ID
김연정scopus
Issue Date
2025
Journal Title
COATINGS
ISSN
2079-6412JCR Link
Citation
COATINGS vol. 15, no. 11
Keywords
DC magnetron sputtering; particle-in-cell simulation; artificial intelligence; transformer-based regression model
Publisher
MDPI
Indexed
SCIE; SCOPUS WOS scopus
Document Type
Article
Abstract
A numerical method to estimate the plasma characteristics with the variation in control parameters is suggested with an artificial intelligence model using limited finite datasets. A transformer-based regression method was applied to estimate the spatial profiles of plasma characteristics in a DC magnetron sputtering system from limited data obtained by a two-dimensional particle-in-cell simulation under varying pressure. Based on the obtained simulation data, an artificial intelligence method successfully predicts the energy and angular distribution of ions incident on the target. This approach enables the quantitative estimation of the impact of various system parameter changes on plasma characteristics using only a limited number of simulation results. It is beneficial for practical applications, such as process optimization, because the ion energy and angle distributions can be estimated very fast without simulating all the cases.
DOI
10.3390/coatings15111248
Appears in Collections:
ETC > ETC
Files in This Item:
coatings-15-01248.pdf(2.61 MB) Download
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