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Engineering anisotropic magnetoresistance of Hall bars with interfacial organic layers

Title
Engineering anisotropic magnetoresistance of Hall bars with interfacial organic layers
Authors
Park, Jun Hong; Ribeiro, Mario; Pham, Thi Kim Hang; Lee, Nyun Jong; Eom, Tai-woon; Jo, Junhyeon; Park, Seung-Young; Rhim, Sonny H.; Nakamura, Kohji; Yoo, Jung-Woo; Kim, Tae Hee
Ewha Authors
김태희
SCOPUS Author ID
김태희scopusscopus
Issue Date
2020
Journal Title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN
2166-2746JCR Link
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B vol. 38, no. 4
Publisher
A V S AMER INST PHYSICS
Indexed
SCIE WOS
Document Type
Article
Abstract
Tuning the magnetoresistance behavior of heterostructures composed of nonmagnetic and ferromagnetic (FM) materials is crucial for improving their applicability in electronic and spintronic devices. In this study, we investigate whether the integration of organic layers to NiFe/Pt junctions can result in the modification of the magnetic moment of the FM layer using iron phthalocyanines (FePc) and copper phthalocyanines (CuPc) as the interfacial layers for controlling the spin-charge conversion. Relaxation of the out-of-plane magnetic hard axis of the NiFe/Pt junctions is observed, as a result of the modification of the interfacial magnetic structure. The transport measurements of the fabricated hybrid Hall bar junctions with NiFe/FePc/Pt and NiFe/CuPc/Pt reveal that although the intrinsic anisotropic magnetoresistance of the present Hall bar is maintained with the integration of interfacial metal phthalocyanine (MPc) layers, a change in the magnetic response along the axis perpendicular to the in-plane of Hall bars is observed, owing to the insertion of the interfacial MPc layers. The present method of interface engineering via integration of organic interfacial layers can act as a model system for controlling the spin-charge conversion behavior of magnetic heterojunction toward the development of multifunctional molecular-engineered spintronic devices.
DOI
10.1116/6.0000222
Appears in Collections:
자연과학대학 > 물리학전공 > Journal papers
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