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dc.contributor.author조윌렴*
dc.date.accessioned2016-10-20T02:10:38Z-
dc.date.available2016-10-20T02:10:38Z-
dc.date.issued2009*
dc.identifier.issn1533-4880*
dc.identifier.otherOAK-5426*
dc.identifier.urihttps://dspace.ewha.ac.kr/handle/2015.oak/232538-
dc.description.abstractFerroelectric Bi325La075Ti3O,2 (BLT) thin films have been grown by a sol-gel method. Annealing conditions after the drying process have been explored over a wide range of temperature. BLT thin films prepared on PtJTiO2 coated Si02/Si(100) were investigated by Raman scattering spectroscopy, atomic force microscopy (AFM), and X-ray photoelectron spectroscopy. Raman spectra reveal the growth route of phase-formation of the BLT films. Ferroelectric domains in the thin films are observed by using AFM, registering the electrostatic force response of the thin films in the presence of a low ac field. It is found that the as-grown domain configuration and switching behavior are trongly dependent on growth temperature. Depth-profiling of the electronic states of Bi, Ti, and La atoms shows the oxidation during the growth. Copyright © 2009 American Scientific Publishers All rights reserved.*
dc.languageEnglish*
dc.titleLocal structural and electrical properties of ferroelectric bi325la0ti3o12 thin films on pt*
dc.typeConference Paper*
dc.relation.issue2*
dc.relation.volume9*
dc.relation.indexSCI*
dc.relation.indexSCIE*
dc.relation.indexSCOPUS*
dc.relation.startpage1246*
dc.relation.lastpage1249*
dc.relation.journaltitleJournal of Nanoscience and Nanotechnology*
dc.identifier.doi10.1166/jnn.2009.C130*
dc.identifier.wosidWOS:000263653300130*
dc.identifier.scopusid2-s2.0-67649271028*
dc.author.googleKim T.Y.*
dc.author.googleLee J.H.*
dc.author.googleJo W.*
dc.author.googleKo C.*
dc.author.googleHan M.*
dc.contributor.scopusid조윌렴(7103322276)*
dc.date.modifydate20240123091004*
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자연과학대학 > 물리학전공 > Journal papers
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