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Nanofeature-patterned polymer mold fabrication toward precisely defined nanostructure replication

Title
Nanofeature-patterned polymer mold fabrication toward precisely defined nanostructure replication
Authors
Kim Y.S.Lee N.Y.Lim J.R.Lee M.J.Park S.
Ewha Authors
박성수김연상
Issue Date
2005
Journal Title
Chemistry of Materials
ISSN
0897-4756JCR Link
Citation
Chemistry of Materials vol. 17, no. 23, pp. 5867 - 5870
Indexed
SCI; SCIE; SCOPUS WOS scopus
Document Type
Article
Abstract
A simple strategy for patterning and replicating high aspect ratio nanostructures onto a polymer mold is reported. A mercapto ester type UV-curable prepolymer has been introduced as a choice of material for manufacturing polymer molds having nanopatterns with physical barriers sufficiently hard and robust enough to preserve firm and concrete nanostructures. In addition, a simple surface treatment technique for easy release of coated film from the polymer mold has been introduced. A polymer mold having precise nanoscale patterns of high aspect ratio with high feature density was successfully fabricated, and its nanopatterns were properly transferred onto the surface of a thin replica film, demonstrating the potential of this polymer material as a stamp for rapid replication of accurate nanostructures with great simplicity. © 2005 American Chemical Society.
DOI
10.1021/cm0508569
Appears in Collections:
자연과학대학 > 화학·나노과학전공 > Journal papers
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