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dc.contributor.author박성민*
dc.date.accessioned2018-05-02T08:15:56Z-
dc.date.available2018-05-02T08:15:56Z-
dc.date.issued2004*
dc.identifier.issn0018-9200*
dc.identifier.otherOAK-2200*
dc.identifier.urihttps://dspace.ewha.ac.kr/handle/2015.oak/242837-
dc.description.abstractA 1-Gb/s differential transimpedance amplifier (TIA) is realized in a 0.25-μm standard CMOS technology, incorporating the regulated cascode input configuration. The TIA chip is then integrated with a p-i-n photodiode on an oxidized phosphorous-silicon (OPS) substrate by employing the multi-chip-on-oxide (MCO) technology. The MCO TIA demonstrates 80-dBΩ transimpedance gain, 670-MHz bandwidth for 1-pF photodiode capacitance, 0.54-μA average input noise current, - 17-dBm sensitivity for 10 -12 bit-error rate (BER), and 27-mW power dissipation from a single 2.5-V supply. It also shows negligible switching noise effect from an embedded VCO on the OPS substrate. Furthermore, a four-channel MCO TIA array is implemented for optical interconnects, resulting in less than - 40-dB crosstalk between adjacent channels.*
dc.languageEnglish*
dc.title1-Gb/s 80-dBΩ fully differential CMOS transimpedance amplifier in multichip on oxide technology for optical interconnects*
dc.typeArticle*
dc.relation.issue6*
dc.relation.volume39*
dc.relation.indexSCI*
dc.relation.indexSCIE*
dc.relation.indexSCOPUS*
dc.relation.startpage971*
dc.relation.lastpage974*
dc.relation.journaltitleIEEE Journal of Solid-State Circuits*
dc.identifier.doi10.1109/JSSC.2004.827795*
dc.identifier.wosidWOS:000221803600014*
dc.identifier.scopusid2-s2.0-2942689655*
dc.author.googlePark S.M.*
dc.author.googleLee J.*
dc.author.googleYoo H.-J.*
dc.contributor.scopusid박성민(7501832231)*
dc.date.modifydate20240322125443*
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공과대학 > 전자전기공학전공 > Journal papers
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