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Dewetting of thin polystyrene films under confinement

Title
Dewetting of thin polystyrene films under confinement
Authors
Peng J.Xing R.Wu Y.Li B.Han Y.Knoll W.Kim D.H.
Ewha Authors
김동하
SCOPUS Author ID
김동하scopus
Issue Date
2007
Journal Title
Langmuir
ISSN
0743-7463JCR Link
Citation
vol. 23, no. 5, pp. 2326 - 2329
Indexed
SCI; SCIE; SCOPUS WOS scopus
Abstract
The dewetting behavior of thin polystyrene (PS) film has been investigated by placing an upper plate with a ca. 140 nm gap from the underlying substrate with the spin-coated thin polymer films. Three different kinds of dewetting behaviors of thin PS film have been observed after annealing according to the relative position of the PS film to the upper plate. Since the upper plate is smaller than the underlying substrate, a part of the polymer film is not covered by the plate. In this region (I), thin PS film dewetting occurs in a conventional manner, as previously reported. While in the region covered by the upper plate (III), the PS film exhibits unusual dewetted patterns. Meanwhile, in the area right under the edge of the plate (II) (i.e., the area between region I and region III), highly ordered arrays of PS droplets are formed. Formation mechanisms of different dewetted patterns are discussed in detail. This study may offer an effective way to improve the understanding of various dewetting behaviors and facilitate the ongoing exploration of utilizing dewetting as a patterning technique. © 2007 American Chemical Society.
DOI
10.1021/la061911a
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자연과학대학 > 화학·나노과학전공 > Journal papers
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