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Characterization of Ag nanoparticles on Si wafer prepared using Tollen's reagent and acid-etching

Title
Characterization of Ag nanoparticles on Si wafer prepared using Tollen's reagent and acid-etching
Authors
Lim D.C.Lopez-Salido I.Kim Y.D.
Ewha Authors
김영독
Issue Date
2006
Journal Title
Applied Surface Science
ISSN
0169-4332JCR Link
Citation
vol. 253, no. 2, pp. 959 - 965
Indexed
SCI; SCIE; SCOPUS WOS scopus
Abstract
Ag nanoparticles on SiO2/Si surfaces synthesized using the Tollen's reagent and a subsequent acid-etching were characterized using X-ray photoelectron spectroscopy (XPS). Combining the reduction of the Tollen's reagent and the chemical etching, one can create naked Ag nanoparticles with various sizes in the size range below ∼10 nanometers (nm). The reduced particle size by the chemical etching was identified using positive core level shifts with increasing etching time. Ag nanoparticles smaller than ∼3 nm undergo a reversible oxidation and reduction cycle by reacting with H2O2/H2O and a subsequent heating under vacuum to 150 °C, which was not found for the bulk counterparts and larger particles, demonstrating unique chemical properties of nanoparticles compared to the bulk counterparts. © 2006 Elsevier B.V. All rights reserved.
DOI
10.1016/j.apsusc.2006.01.040
Appears in Collections:
자연과학대학 > 화학·나노과학전공 > Journal papers
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