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dc.contributor.author한승우-
dc.date.accessioned2017-02-15T08:02:37Z-
dc.date.available2017-02-15T08:02:37Z-
dc.date.issued2006-
dc.identifier.issn0003-6951-
dc.identifier.otherOAK-3606-
dc.identifier.urihttps://dspace.ewha.ac.kr/handle/2015.oak/234136-
dc.description.abstractThe influence of electron injection on the electric-pulse-induced resistive switching of PtTi O2 thin film/Pt structure was studied by current-voltage (I-V) measurements. The electron injection was increased by annealing the sample in a N2 atmosphere or measuring the I-V characteristics at high temperatures (<100 °C). The switching from the high-resistance state (HRS) to the low-resistance state by a filamentary mechanism was suppressed when the carrier injection by Schottky emission or space-charge-limited conduction (SCLC) was excessive. Interfacial potential barrier played a crucial role in determining the carrier injection. Switching was observed (not observed) when the HRS resistance was low (high) although SCLC was observed. © 2006 American Institute of Physics.-
dc.languageEnglish-
dc.titleInfluence of carrier injection on resistive switching of TiO2 thin films with Pt electrodes-
dc.typeArticle-
dc.relation.issue16-
dc.relation.volume89-
dc.relation.indexSCI-
dc.relation.indexSCIE-
dc.relation.indexSCOPUS-
dc.relation.journaltitleApplied Physics Letters-
dc.identifier.doi10.1063/1.2361268-
dc.identifier.wosidWOS:000241405200079-
dc.identifier.scopusid2-s2.0-33750187879-
dc.author.googleKim K.M.-
dc.author.googleChoi B.J.-
dc.author.googleJeong D.S.-
dc.author.googleHwang C.S.-
dc.author.googleHan S.-
dc.contributor.scopusid한승우(55557541900)-
dc.date.modifydate20211210152321-


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