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Morphologies in solvent-annealed thin films of symmetric diblock copolymer

Title
Morphologies in solvent-annealed thin films of symmetric diblock copolymer
Authors
Peng J.Kim D.H.Knoll W.Xuan Y.Li B.Han Y.
Ewha Authors
김동하
SCOPUS Author ID
김동하scopus
Issue Date
2006
Journal Title
Journal of Chemical Physics
ISSN
0021-9606JCR Link
Citation
vol. 125, no. 6
Indexed
SCI; SCIE; SCOPUS WOS scopus
Abstract
We have systematically studied the thin film morphologies of symmetric poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer after annealing to solvents with varying selectivity. Upon neutral solvent vapor annealing, terraced morphology is observed without any lateral structures on the surfaces. When using PS-selective solvent annealing, the film exhibits macroscopically flat with a disordered micellar structure. While PMMA-selective solvent annealing leads to the dewetting of the film with fractal-like holes, with highly ordered nanoscale depressions in the region of undewetted films. In addition, when decreasing the swelling degree of the film in the case of PMMA-selective solvent annealing, hills and valleys are observed with the coexistence of highly ordered nanoscale spheres and stripes on the surface, in contrast to the case of higher swelling degree. The differences are explained qualitatively on the basis of polymer-solvent interaction parameters of the different components. © 2006 American Institute of Physics.
DOI
10.1063/1.2219446
Appears in Collections:
자연과학대학 > 화학·나노과학전공 > Journal papers
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