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dc.contributor.author김동욱*
dc.date.accessioned2016-08-29T11:08:35Z-
dc.date.available2016-08-29T11:08:35Z-
dc.date.issued2009*
dc.identifier.issn0003-6951*
dc.identifier.otherOAK-5333*
dc.identifier.urihttps://dspace.ewha.ac.kr/handle/2015.oak/231874-
dc.description.abstractAg/NiO/Pt structures did (did not) exhibit reproducible resistive switching when a positive bias was applied to the Pt (Ag) electrode. X-ray photoemission spectra revealed that ultrathin NiO films on Pt (Ag) layers did (did not) undergo reversible chemical state change during heat treatment in a vacuum and oxygen ambient. Such differences in interfacial chemical interaction may affect filament formation and rupture processes near the electrode and hence alter the resistive switching behaviors. © 2009 American Institute of Physics.*
dc.languageEnglish*
dc.titleInterfacial reactions and resistive switching behaviors of metal/NiO/metal structures*
dc.typeArticle*
dc.relation.issue2*
dc.relation.volume94*
dc.relation.indexSCI*
dc.relation.indexSCIE*
dc.relation.indexSCOPUS*
dc.relation.journaltitleApplied Physics Letters*
dc.identifier.doi10.1063/1.3072800*
dc.identifier.wosidWOS:000262534900060*
dc.identifier.scopusid2-s2.0-58349122337*
dc.author.googlePhark S.H.*
dc.author.googleJung R.*
dc.author.googleChang Y.J.*
dc.author.googleNoh T.W.*
dc.author.googleKim D.-W.*
dc.contributor.scopusid김동욱(57203350633)*
dc.date.modifydate20240123114549*


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