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dc.contributor.author김연상-
dc.date.accessioned2016-08-27T02:08:50Z-
dc.date.available2016-08-27T02:08:50Z-
dc.date.issued2007-
dc.identifier.issn1738-8090-
dc.identifier.otherOAK-4766-
dc.identifier.urihttps://dspace.ewha.ac.kr/handle/2015.oak/216239-
dc.description.abstractWe introduce a universal strategy virtually applicable to any types of stamping molds to achieve anti-adhesion surface for simple and rapid fabrication and replication of nanostructures with high fidelity. The surface of various hard and soft molds irrespective of basic mold materials have been bound strongly and covalently with poly(dimethylsiloxane) (PDMS), which has a good and optimum surface property for molding process such as low surface energy and low adhesion property like normal PDMS mold. In particular, nano-featured replica molds were fabricated from SiO2 nanostructures with general UV-curing polymers. With this method, we replicated complex nanostructures with high aspect ratios on various substrates over several square inches.-
dc.languageKorean-
dc.publisherKOREAN INST METALS MATERIALS-
dc.subjectimprint lithography-
dc.subjectreplica mold-
dc.subjectpolymer mold-
dc.subjectsurface treatment-
dc.subjectanti-adhesive coating-
dc.titleFabrication of replica polymer mold for imprint lithography-
dc.typeArticle-
dc.relation.issue3-
dc.relation.volume3-
dc.relation.indexSCIE-
dc.relation.indexSCOPUS-
dc.relation.indexKCI-
dc.relation.startpage155-
dc.relation.lastpage162-
dc.relation.journaltitleELECTRONIC MATERIALS LETTERS-
dc.identifier.wosidWOS:000255333800008-
dc.author.googleLee, Min Jung-
dc.author.googleKim, Youn Sang-
dc.contributor.scopusid김연상(8938854200)-
dc.date.modifydate20211210152421-
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자연과학대학 > 화학·나노과학전공 > Journal papers
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