View : 442 Download: 67
Quantitative Monitoring of Tattoo Contrast Variations after 755-nm Laser Treatments in In Vivo Tattoo Models
- Title
- Quantitative Monitoring of Tattoo Contrast Variations after 755-nm Laser Treatments in In Vivo Tattoo Models
- Authors
- Kim, Myeongjin; Park, Suhyun; Lee, Hyun Uk; Kang, Hyun Wook
- Ewha Authors
- 박수현
- SCOPUS Author ID
- 박수현
- Issue Date
- 2020
- Journal Title
- SENSORS
- ISSN
- 1424-8220
- Citation
- SENSORS vol. 20, no. 1
- Keywords
- CMOS sensor; image contrast; laser treatment; tattoo model
- Publisher
- MDPI
- Indexed
- SCIE; SCOPUS
- Document Type
- Article
- Abstract
- Laser lights have been used by dermatologists for tattoo removal through photothermal interactions. However, most clinical studies used a visual scoring method to evaluate the tattoo removal process less objectively, leading to unnecessary treatments. This study aimed to develop a simple and quantitative imaging method to monitor the degree of tattoo removal in in vivo skin models. Sprague Dawley rat models were tattooed with four different concentrations of black inks. Laser treatment was performed weekly on the tattoos using a wavelength of 755 nm over six weeks. Images of non-treated and treated samples were captured using the same method after each treatment. The intensities of the tattoos were measured to estimate the contrast for quantitative comparison. The results demonstrated that the proposed monitoring method quantified the variations in tattoo contrast after the laser treatment. Histological analysis validated the significant removal of tattoo inks, no thermal injury to adjacent tissue, and uniform remodeling of epidermal and dermal layers after multiple treatments. This study demonstrated the potential of the quantitative monitoring technique in assessing the degree of clearance level objectively during laser treatments in clinics.
- DOI
- 10.3390/s20010285
- Appears in Collections:
- 공과대학 > 전자전기공학전공 > Journal papers
- Files in This Item:
-
sensors-20-00285.pdf(2.74 MB)
Download
- Export
- RIS (EndNote)
- XLS (Excel)
- XML