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dc.contributor.author양인상-
dc.date.accessioned2016-08-29T12:08:34Z-
dc.date.available2016-08-29T12:08:34Z-
dc.date.issued2014-
dc.identifier.isbn9781628410075-
dc.identifier.issn1996-756X-
dc.identifier.otherOAK-14394-
dc.identifier.urihttp://dspace.ewha.ac.kr/handle/2015.oak/230290-
dc.description.abstractAFM; Etching; FPA; Indium antimonide (InSb); Infrared (IR); Multi-step; Plasma; Raman spectroscopy-
dc.description.sponsorshipThe Society of Photo-Optical Instrumentation Engineers (SPIE)-
dc.languageEnglish-
dc.publisherSPIE-
dc.titleMulti-step plasma etching process for development of highly photosensitive InSb mid-IR FPAs-
dc.typeConference Paper-
dc.relation.volume9070-
dc.relation.indexSCOPUS-
dc.relation.journaltitleProceedings of SPIE - The International Society for Optical Engineering-
dc.identifier.doi10.1117/12.2053215-
dc.identifier.scopusid2-s2.0-84906270531-
dc.author.googleSeok C.-
dc.author.googleChoi M.-
dc.author.googleYang I.-S.-
dc.author.googlePark S.-
dc.author.googlePark Y.-
dc.author.googleYoon E.-
dc.contributor.scopusid양인상(7101797839)-
dc.date.modifydate20170518143938-
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