DSpace at EWHA: Multi-step plasma etching process for development of highly photosensitive InSb mid-IR FPAs

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DC Field	Value	Language
dc.contributor.author	양인상	-
dc.date.accessioned	2016-08-29T12:08:34Z	-
dc.date.available	2016-08-29T12:08:34Z	-
dc.date.issued	2014	-
dc.identifier.isbn	9781628410075	-
dc.identifier.issn	1996-756X	-
dc.identifier.other	OAK-14394	-
dc.identifier.uri	https://dspace.ewha.ac.kr/handle/2015.oak/230290	-
dc.description.abstract	AFM; Etching; FPA; Indium antimonide (InSb); Infrared (IR); Multi-step; Plasma; Raman spectroscopy	-
dc.description.sponsorship	The Society of Photo-Optical Instrumentation Engineers (SPIE)	-
dc.language	English	-
dc.publisher	SPIE	-
dc.title	Multi-step plasma etching process for development of highly photosensitive InSb mid-IR FPAs	-
dc.type	Conference Paper	-
dc.relation.volume	9070	-
dc.relation.index	SCOPUS	-
dc.relation.journaltitle	Proceedings of SPIE - The International Society for Optical Engineering	-
dc.identifier.doi	10.1117/12.2053215	-
dc.identifier.scopusid	2-s2.0-84906270531	-
dc.author.google	Seok C.	-
dc.author.google	Choi M.	-
dc.author.google	Yang I.-S.	-
dc.author.google	Park S.	-
dc.author.google	Park Y.	-
dc.author.google	Yoon E.	-
dc.contributor.scopusid	양인상(7101797839)	-
dc.date.modifydate	20230210140835	-