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High Photoresponse in Conformally Grown Monolayer MoS2 on a Rugged Substrate

Title
High Photoresponse in Conformally Grown Monolayer MoS2 on a Rugged Substrate
Authors
Tri Khoa NguyenAnh Duc NguyenLe, Chinh TamUllah, FarmanTahir, ZeeshanKoo, Kyo-inKim, EunahKim, Dong-WookJang, Joon I.Kim, Yong Soo
Ewha Authors
김동욱
SCOPUS Author ID
김동욱scopus
Issue Date
2018
Journal Title
ACS APPLIED MATERIALS & INTERFACES
ISSN
1944-8244JCR Link
Citation
ACS APPLIED MATERIALS & INTERFACES vol. 10, no. 47, pp. 40824 - 40830
Keywords
MoS2large scaleconformal growthmetal-organic chemical vapor depositionphotoresponse
Publisher
AMER CHEMICAL SOC
Indexed
SCI; SCIE; SCOPUS WOS
Document Type
Article
Abstract
Conformal growth of atomic-thick semiconductor layers on patterned substrates can boost up the performance of electronic and optoelectronic devices remarkably. However, conformal growth is a very challenging technological task, since the control of the growth processes requires utmost precision. Herein, we report on conformal growth and characterization of monolayer MoS2 on planar, microrugged, and nanorugged SiO2/Si substrates via metal-organic chemical vapor deposition. The continuous and conformal nature of monolayer MoS2, on the rugged surface was verified by high-resolution transmission electron microscopy. Strain effects were examined by photoluminescence (PL) and Raman spectroscopy. Interestingly, the photoresponsivity (similar to 254.5 mA/W) of as-grown MoS2 on the nanorugged substrate was 59 times larger than that of the planar sample (4.3 mA/W) under a small applied bias of 0.1 V. This value is record high when compared with all previous MoS2-based photocurrent generation under low or zero bias. Such enhancement in the photoresponsivity arises from a large active area for light-matter interaction and local strain for PL quenching, wherein the latter effect is the key factor and unique in the conformally grown monolayer on the nanorugged surface.
DOI
10.1021/acsami.8b15673
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자연과학대학 > 물리학전공 > Journal papers
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