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dc.contributor.author한승우-
dc.date.accessioned2017-02-15T08:02:25Z-
dc.date.available2017-02-15T08:02:25Z-
dc.date.issued2007-
dc.identifier.issn0003-6951-
dc.identifier.otherOAK-4081-
dc.identifier.urihttps://dspace.ewha.ac.kr/handle/2015.oak/234371-
dc.description.abstractBased on the first-principles calculations, the authors study defect-defect interactions between cation vacancies in rutile TiO2 and monoclinic HfO2. It is found that vacancies are greatly stabilized at small separations because of a large reconstruction of nearby oxygen atoms that have two broken bonds. As a result, O-O bonds resembling O2 or O 3 molecules are formed near the divacancy site. The defect levels originated from antibonding states of O p orbitals are identified within the energy gap, which can affect leakage currents and the density of trapped charges of oxides substantially. © 2007 American Institute of Physics.-
dc.languageEnglish-
dc.titlePairing of cation vacancies and gap-state creation in TiO2 and HfO2-
dc.typeArticle-
dc.relation.issue25-
dc.relation.volume90-
dc.relation.indexSCI-
dc.relation.indexSCIE-
dc.relation.indexSCOPUS-
dc.relation.journaltitleApplied Physics Letters-
dc.identifier.doi10.1063/1.2749858-
dc.identifier.wosidWOS:000247468900071-
dc.identifier.scopusid2-s2.0-34547413977-
dc.author.googleAhn H.-S.-
dc.author.googleHan S.-
dc.author.googleHwang C.S.-
dc.contributor.scopusid한승우(55557541900)-
dc.date.modifydate20211210152321-


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