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dc.contributor.author김연상-
dc.date.accessioned2017-01-18T02:01:34Z-
dc.date.available2017-01-18T02:01:34Z-
dc.date.issued2007-
dc.identifier.issn0957-4484-
dc.identifier.otherOAK-4308-
dc.identifier.urihttps://dspace.ewha.ac.kr/handle/2015.oak/234011-
dc.description.abstractIn this paper, we introduce an anti-adhesion poly(dimethylsiloxane) (PDMS)-coated flexible mold and its applications for room-temperature imprint lithography. The flexible mold is fabricated using an ultraviolet-curable prepolymer on a flexible substrate, and its surface is passivated with a thin layer of PDMS to impart an anti-adhesion property. The highly flexible mold enables conformal contact with a substrate on which a low-viscosity polymer resist is spin-cast in a thin layer. Large-area imprinting is then realized at room temperature under significantly reduced pressure. The mold was durable even after repetitive imprinting of over 200 times. Also, we show a double imprinting on the substrate with a PDMS-coated replica polymeric mold having 500 nm line patterns. This enables the formation of matrix patterns with varying feature heights in less than 7 min. © IOP Publishing Ltd.-
dc.languageEnglish-
dc.titleA poly(dimethylsiloxane)-coated flexible mold for nanoimprint lithography-
dc.typeArticle-
dc.relation.issue41-
dc.relation.volume18-
dc.relation.indexSCI-
dc.relation.indexSCIE-
dc.relation.indexSCOPUS-
dc.relation.journaltitleNanotechnology-
dc.identifier.doi10.1088/0957-4484/18/41/415303-
dc.identifier.wosidWOS:000249735600007-
dc.identifier.scopusid2-s2.0-34748901159-
dc.author.googleLee N.Y.-
dc.author.googleKim Y.S.-
dc.contributor.scopusid김연상(8938854200)-
dc.date.modifydate20211210152421-
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자연과학대학 > 화학·나노과학전공 > Journal papers
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