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Nanopatterned carbon films with engineered morphology by direct carbonization of UV-stabilized block copolymer films

Title
Nanopatterned carbon films with engineered morphology by direct carbonization of UV-stabilized block copolymer films
Authors
Wang Y.Liu J.Christiansen S.Kim D.H.Gosele U.Steinhart M.
Ewha Authors
김동하
SCOPUS Author ID
김동하scopus
Issue Date
2008
Journal Title
Nano Letters
ISSN
1530-6984JCR Link
Citation
vol. 8, no. 11, pp. 3993 - 3997
Indexed
SCI; SCIE; SCOPUS WOS scopus
Abstract
Nanopatterned thin carbon films were prepared by direct and expeditious carbonization of the block copolymer polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) without the necessity of slow heating to the process temperature and of addition of further carbon precursors. Carbonaceous films having an ordered "dots-on-film" surface topology were obtained from reverse micelle monolayers. The regular nanoporous morphology of PS-b-P2VP films obtained by subjecting reverse micelle monolayers to swelling-induced surface reconstruction could likewise be transferred to carbon films thus characterized by ordered nanopit arrays. Stabilization of PS-b-P2VP by UV irradiation and the concurrent carbonization of both blocks were key to the conservation of the film topography. The approach reported here may enable the realization of a broad range of nanoscaled architectures for carbonaceous materials using a block copolymer ideally suited as a template because of the pronounced repulsion between its blocks and its capability to form highly ordered microdomain structures. © 2008 American Chemical Society.
DOI
10.1021/nl802554h
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자연과학대학 > 화학·나노과학전공 > Journal papers
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