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Multi-step plasma etching process for development of highly photosensitive InSb mid-IR FPAs

Title
Multi-step plasma etching process for development of highly photosensitive InSb mid-IR FPAs
Authors
Seok C.Choi M.Yang I.-S.Park S.Park Y.Yoon E.
Ewha Authors
양인상
SCOPUS Author ID
양인상scopus
Issue Date
2014
Journal Title
Proceedings of SPIE - The International Society for Optical Engineering
ISSN
1996-756XJCR Link
Citation
vol. 9070
Publisher
SPIE
Indexed
SCOPUS scopus
Abstract
AFM; Etching; FPA; Indium antimonide (InSb); Infrared (IR); Multi-step; Plasma; Raman spectroscopy
DOI
10.1117/12.2053215
ISBN
9781628410075
Appears in Collections:
자연과학대학 > 물리학전공 > Journal papers
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