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dc.contributor.author신형순*
dc.date.accessioned2016-08-28T11:08:15Z-
dc.date.available2016-08-28T11:08:15Z-
dc.date.issued2014*
dc.identifier.issn1598-1657*
dc.identifier.otherOAK-11473*
dc.identifier.urihttps://dspace.ewha.ac.kr/handle/2015.oak/227870-
dc.description.abstractElectron mobility; Intervalley phonon mobility; Intravalley phonon mobility; Strain; Stress; Temperature*
dc.languageEnglish*
dc.publisherInstitute of Electronics Engineers of Korea*
dc.titleTemperature dependence of electron mobility in uniaxial strained nMOSFETs*
dc.typeArticle*
dc.relation.issue2*
dc.relation.volume14*
dc.relation.indexSCIE*
dc.relation.indexSCOPUS*
dc.relation.indexKCI*
dc.relation.startpage146*
dc.relation.lastpage152*
dc.relation.journaltitleJournal of Semiconductor Technology and Science*
dc.identifier.doi10.5573/JSTS.2014.14.2.146*
dc.identifier.wosidWOS:000336958100002*
dc.identifier.scopusid2-s2.0-84900017646*
dc.author.googleSun W.*
dc.author.googleShin H.*
dc.contributor.scopusid신형순(7404012125)*
dc.date.modifydate20240322125227*
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공과대학 > 전자전기공학전공 > Journal papers
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