DSpace at EWHA: Effect of oxygen plasma treatment on the electrical properties in Ag/bulk ZnO Schottky diodes

View : 559 Download: 0

Full metadata record

DC Field	Value	Language
dc.contributor.author	김동욱	*
dc.date.accessioned	2016-08-28T11:08:35Z	-
dc.date.available	2016-08-28T11:08:35Z	-
dc.date.issued	2014	*
dc.identifier.issn	0042-207X	*
dc.identifier.other	OAK-10967	*
dc.identifier.uri	https://dspace.ewha.ac.kr/handle/2015.oak/227471	-
dc.description.abstract	Bias voltage and frequency; Bulk ZnO; Capacitance voltage measurements; Interface state density; Oxygen plasmas; Schottky contacts; Series resistances; Strong dependences; Electric resistance; Interface states; Oxygen; Plasma applications; Plasmas; Schottky barrier diodes; Zinc oxide; Electric properties	*
dc.language	English	*
dc.title	Effect of oxygen plasma treatment on the electrical properties in Ag/bulk ZnO Schottky diodes	*
dc.type	Article	*
dc.relation.volume	101	*
dc.relation.index	SCI	*
dc.relation.index	SCIE	*
dc.relation.index	SCOPUS	*
dc.relation.startpage	92	*
dc.relation.lastpage	97	*
dc.relation.journaltitle	Vacuum	*
dc.identifier.doi	10.1016/j.vacuum.2013.07.024	*
dc.identifier.wosid	WOS:000330143000017	*
dc.identifier.scopusid	2-s2.0-84883160358	*
dc.author.google	Kim H.	*
dc.author.google	Kim D.-W.	*
dc.contributor.scopusid	김동욱(57203350633)	*
dc.date.modifydate	20240123114549	*