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Evolution of local work function in epitaxial VO 2 thin films spanning the metal-insulator transition

Title
Evolution of local work function in epitaxial VO 2 thin films spanning the metal-insulator transition
Authors
Sohn A.Kim H.Kim D.-W.Ko C.Ramanathan S.Park J.Seo G.Kim B.-J.Shin J.-H.Kim H.-T.
Ewha Authors
김동욱
SCOPUS Author ID
김동욱scopus
Issue Date
2012
Journal Title
Applied Physics Letters
ISSN
0003-6951JCR Link
Citation
vol. 101, no. 19
Indexed
SCI; SCIE; SCOPUS WOS scopus
Abstract
Transport and Kelvin probe force microscopy measurements were simultaneously conducted on epitaxial VO 2 thin films. The samples work function abruptly dropped from 4.88 eV to 4.70 eV during heating from 333 K to 353 K, suggesting a significant change in its electronic band structure spanning the metal insulator transition. The work function showed nearly no statistical deviation across the films surface during the transition, likely due to band bending at the boundaries of the small domains. Resistance profiles confirmed that the local work function corresponded closely to the resistance of the corresponding area. © 2012 American Institute of Physics.
DOI
10.1063/1.4766292
Appears in Collections:
자연과학대학 > 물리학전공 > Journal papers
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