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Scanning probe lithography for fabrication of Ti metal nanodot arrays

Title
Scanning probe lithography for fabrication of Ti metal nanodot arrays
Authors
Jung B.Jo W.Gwon M.J.Lee E.Kim D.-W.
Ewha Authors
조윌렴김동욱
SCOPUS Author ID
조윌렴scopus; 김동욱scopus
Issue Date
2010
Journal Title
Ultramicroscopy
ISSN
0304-3991JCR Link
Citation
vol. 110, no. 6, pp. 737 - 740
Indexed
SCI; SCIE; SCOPUS WOS scopus
Abstract
We report fabrication of Ti metal nanodot arrays by scanning probe microscopic indentation. A thin poly-methylmethacrylate (PMMA) layer was spin-coated on Si substrates with thickness of 70nm. Nanometer-size pore arrays were formed by indenting the PMMA layer using a cantilever of a scanning probe microscope. Protuberances with irregular boundaries appeared during the indentation process. Control of approach and pulling-out speed during indentation was able to dispose of the protrusions. Ti metal films were deposited on the patterned PMMA layers by a radio-frequency sputtering method and subsequently lifted off to obtain metal nanodot arrays. The fabricated metal nanodot arrays have 200nm of diameter and 500nm of interdistance, which corresponds to a density of 4×10 8/cm 2. Scanning probe-based measurement of current-voltage (I-V) behaviors for a single Ti metal nanodot showed asymmetric characteristics. Applying external bias is likely to induce oxidation of Ti metal, since the conductance decreased and volume change of the dots was observed. I-V behaviors of Ti metal nanodots by conventional e-beam lithography were also characterized for comparison. © 2010 Elsevier B.V.
DOI
10.1016/j.ultramic.2010.02.042
Appears in Collections:
자연과학대학 > 물리학전공 > Journal papers
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