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Suppression of surface crystallization on borosilicate glass using RF plasma treatment

Title
Suppression of surface crystallization on borosilicate glass using RF plasma treatment
Authors
Yoo, SunghyunJi, Chang-HyeonJin, Joo-YoungKim, Yong-Kweon
Ewha Authors
지창현
SCOPUS Author ID
지창현scopus
Issue Date
2014
Journal Title
APPLIED SURFACE SCIENCE
ISSN
0169-4332JCR Link1873-5584JCR Link
Citation
vol. 316, pp. 484 - 490
Keywords
Surface crystallizationBorosilicate glassPlasma treatmentMicro-optical device
Publisher
ELSEVIER SCIENCE BV
Indexed
SCI; SCIE; SCOPUS WOS
Abstract
Surface crystallization on a commercial grade borosilicate glass wafer, Borofloat (R) 33, is effectively prevented against 3 h of thermal reflow process at 850 degrees C. Surface plasma treatment with three different reactive gases, CF4, SF6, and Cl-2, has been performed prior to the annealing. The effect of plasma treatment on surface ion concentration and nucleation of cristobalite were examined through optical microscope and x-ray photoemission spectroscopy. The dominant cause that suppresses crystallization was verified to be the increase of surface ion concentration of alumina during the plasma treatment. Both CF4 and SF6 treatment of no less than 30 s showed significant efficacy in suppressing crystallization by a factor of more than 112. Average surface roughness and the optical transparency were also enhanced by a factor of 15 and 3, respectively, compared to untreated sample. (C) 2014 Elsevier B.V. All rights reserved.
DOI
10.1016/j.apsusc.2014.07.083
Appears in Collections:
엘텍공과대학 > 전자공학과 > Journal papers
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